[반도체] The Principle and Application of AFM in semiconductor process
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[반도체] The Principle and Application of AFM in semiconductor process에 대한 자료입니다.
목차
Introduction
The description of SPM (Scanning Probe Microscopy)
The principle and properties of AFM (Atomic Force Microscopy)
The AFM application to semiconductor manufacturing
Conclusion
Reference
본문내용
Like a finger in the macro world so feels a tiny tip on a lever in the nano world a surface Forces are in Pico Newton range the same like intermolecular binding forces


1-1. AFM tip
- actually feels the sample surface.
- silicon nitride
exhibit excellent flexibility, Contact AFM mode
- silicon crystal
high frequency oscillating(100kHz), more stiffer than silicon nitride, non contact AFM mode


Three basic types of AFM

coulumic force/0.1nN
고속으로 표면분석가능/표면 높낮이가 심한 시료도 가능
마찰력으로 인한 이미지 왜곡/유기물 박막 측정시 시료 손상


-10nm이하 진폭으로 캔틸레버 진동
-시료손상 없음
-시료와 탐침 사이의 간격이 멀어 선명한 이미지 어렵다


-20-100nm이하 진폭 이용
-시료손상 없음/1-5nm 수평 분해능
-스캔속도 느림


The ability to tailor the chemical composition and structure of a
surface on the 1–100 nm length scale is important to researchers
studying topics ranging from electronic conduction, to catalysis, to
biological recognition in nanoscale systems.

While microfabrication techniques such as photolithography, microcontact
printing, micromachining, and microwriting can produce patterns as small
as 0.1 mm, production of sub-100-nm structures still poses a significant
challenge.

At present, such high-resolution fabrication can be achieved using scanning
probe lithography (SPL).


참고문헌
1.www.cheric.org
Reading-Writing-Measuring Tool로서의 Atomic Force Microscopy 의 최신 연구 동향, 김영훈
2. Handbook of Semiconductor Manufacturing Technology, Yoshio Nishi, Robert Doering, MARCEL DEKKER
3. Appl.Phys.Lett. 73, 2051, 1998
4. Appl.Phys.Lett. 66, 1729, 1995
5. Science, 283, 661, 1999
6. Introduction to Semiconductor Manufacturing Technology, Hong Xiao, Prentice Hall
7. Nanotechnology 11 (2000) 1–5. Printed in the UK
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