● Definition of plasma
Plasma is one of the four fundamental states of matter, along with solid, liquid, and gas. It is an ionized gas consisting of a collection of charged particles, including ions, electrons, and neutral atoms or molecules. Plasma can be found naturally in the universe in the form of stars, lightning, and auroras, but it can also be artificially created and controlled for
Introduction (What is plasma?)
1. Definition of plasma
Plasma is one of the four fundamental states of matter, along with solid, liquid, and gas. It is an ionized gas consisting of a collection of charged particles, including ions, electrons, and neutral atoms or molecules. Plasma can be found naturally in the universe in the form of stars, lightning, and auroras, but it can also be artif
1.Introduction
Every creaturein the nature strives against environmental change to survive.
Some cold-blooded animals such as chameleon or cuttlefish change their body's color to surrounding color, in case of some fishes like ase cucumber, they transform theirshape under stimuli, and some creature like flytrap, they rapidly response to stimuli to prey. Those surcical instinctsclude serial proc
3. Requirements of EUV resist
EUV is highly absorbed by all materials, even EUV optical components inside the lithography tool are susceptible to damage, mainly manifest as observable ablation. Such damage that is associated with the high-energy process of generating EUV radiation is a new concern specific to EUV lithography .
EUVL's shorter wavelength also increases flare, resulting in less
ML2 means the maskless lithography. It is necessary to refinement process. Described above, "double / mutiful patterning" in additional cost savings as an alternative to be appropriate. Nano devices with decreasing the size of the unilateral use light to produce a mask for the lithography process takes time and cost. Small production of nano scale patterning process is suitable, and the suitable