4. Equipment
4.1 RCA cleaning
RCA cleaning is a series of rinsing procedure prior to experiment with Si wafer. The purpose of the RCA clean is to remove organic contaminants (such as dust particles, grease or silica gel) from the wafer surface. There are three steps to be performed. The first step is to remove organic contaminant from surface of wafer. Second step is to remove any oxide layer
● Definition of plasmaPlasma is one of the four fundamental states of matter, along with solid, liquid, and gas. It is an ionized gas consisting of a collection of charged particles, including ions, electrons, and neutral atoms or molecules. Plasma can be found naturally in the universe in the form of stars, lightning, and auroras, but it can also be artificially created and controlled for
Introduction (What is plasma?)
1. Definition of plasmaPlasma is one of the four fundamental states of matter, along with solid, liquid, and gas. It is an ionized gas consisting of a collection of charged particles, including ions, electrons, and neutral atoms or molecules. Plasma can be found naturally in the universe in the form of stars, lightning, and auroras, but it can also be artif
curve shift toward applied voltage because the movement of charges is determined by applied voltage(-,+). It is known that mobile charges are generated when dielectric material has the impurities such as Na ion.
The term fast interface state refers to the fact that these defects can change their charge state relatively fast in response to changes of the gate bias. As the surface potential in a
Introduction
What is Plasma?
Plasma is the fourth state of matter;
solid, liquid, gas and plasma.
Composition matter of universe
What is Atmospheric plasma?
It is easier to produce plasma in low pressure condition than atmospheric, but producing plasma in vacuum state needs many devices.
So, many researcher study that how to produce plasma in atmospheric condition.
This pictur