3. Requirements of EUV resist
EUV is highly absorbed by all materials, even EUV optical components inside the lithography tool are susceptible to damage, mainly manifest as observable ablation. Such damage that is associated with the high-energy process of generating EUV radiation is a new concern specific to EUV lithography .
EUVL's shorter wavelength also increases flare, resulting in less
focusing
on more than 20 interviews with an entrepreneur , corporate data and
media articles. It will give effective implications for understanding the
management succession mechanism that is desirable for all Korean
entrepreneurs who are concerned about management succession.
Entrepreneur, Kortek, Industrial display, Management succession
mechanism, M&A
Kichan Park (제1저자)
Professor, Inha U
focusing on environment such as Reproductive energy wind power generation and solar heat power generation. Also, environment-friendly technologies- water treatment tech and air pollution control tech- apply to all business. Besides, Siemens considers efficiency of energy technology. It evolves complex fire power plant, driving system for industry, high voltage direct current (HVDC) and so on.
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1 aa of each 각각
2 a.c before meals / ante cibum 식전
3 b.i.d twice a day / bis in die 하루 두 번
4 C.C chief complaint 주 증상
5 D/C Discontinue 중지
6 gtt drops 방울
7 hs at bedtime / hora somni 취침시간
8 I&D incision and drainage 절개와 배액
9 I&O intake and output 섭취와 배설
10 NPO nothing by mouth / nothing per oral 금식
11Right eye / oculus dexter