Ion ImplantationIonized dopant atoms are physically forced into the silicon crystal by accelerating them through high potentials (3 kV- 3 MV) toward the silicon wafer.
– Mass separator allows each implanter to run multiple
processes (B, P, BF2, As...)
– Low temperature (room temperature ~200 °C)
• can use photoresist as a mask
– Needs to be followed by an anneal
Contents
Ion channels ion-selective and fluctuate between open and closed states
The membrane potential in animal cells depends mainly on K⁺ leak channels and the K⁺ gradient across the plasma membrane
The resting potential decays only slowly when the Na⁺- K⁺ pump is stopped
The three-dimensional structure of a bacterial K⁺ channel shows how an ion channel can wo
Channel protein
; hydrophilic pore
Ion channel - highly selective pore
open and close
passive transport-diffuse
Nerve cell - Ion channel 이용
Ion channels ion-selective and fluctuate between open and closed states
Ion channel 의 Property
-ion selectivity
-open and close(gate)
Specific stimulus에 의해 open
by lithium ion intercalation
Si has theoretical capacity of 4200mAh/g
Due to it’s large volume change, pulverization can be occurred.
Silicon has high-capacity but poor cycle stability
Carbon has low-capacity but good cycle stability
So silicon/carbon composites can have higher capacity than single carbon anode,
and better cycle stability than single silicon anode.
An ion beam is a type of An ion beam is a type of particle beam consisting of ions.
Ion beams have many uses in electronics manufacturing (principally ion implantation) and other industries.
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