3. Requirements of EUV resist
EUV is highly absorbed by all materials, even EUV optical components inside the lithography tool are susceptible to damage, mainly manifest as observable ablation. Such damage that is associated with the high-energy process of generating EUV radiation is a new concern specific to EUV lithography .
EUVL's shorter wavelength also increases flare, resulting in less
Shortcomings of current process
1. Activated carbon adsorption
2. Direct combustion
3. Catalytic oxidation
4. Ozone oxidation
1. Inconsistent efficiency
Efficiency sharply drops when it works for long time.
It happens as nutrients for microorganisms are insufficient.
2. Unequal growth of microorganisms
Efficiency decreases, hard to handle when factors change suddenly
Water-soluble material-shaving aid material
Molecular weights 에 따라Liquid 또는 low-melting solid 상태로 존재
Physical Properties
Tg= -67oC
Low toxicity
Non-Toxic
의약품, 스킨로션 등
기계적 성질이 안 좋아서 다른 고분자나 이온성 물질과 blend 또는 합성하여 사용
Glass Transition Phenomena
액체를 냉각할 때 물질 고유의 온도
Flow around and through fish gills
Jeesoon Choi and Dongyeop Baek
School of Mechanical and Aerospace Engineering, Seoul National University
Abstract. An overall view of the flow over the fish gills is first described by using the active pump system and the passive ram ventilation. The concept of ram ventilation is introduced and its merits of reducing hydrodynamic drags and efficient e