The lens is used to focus the sectioned UV light down to a smaller area on the chip. The smallest feature size capable of being written on the wafer is a function of the numerical aperture of the lens as well as the wavelength of the light.
uses a patterned elastomer(e.g. PDMS(Poly DiMethyl Siloxane)) as the stamp, mold, or mask to generate micro-patterns and microstructures
C
What is soft-lithography?
So, an alternative and non-photolithographic method that we call soft lithography was developed. Because this method uses a patterned elastomer(e.g. PDMS(Poly DiMethyl Siloxane)) as the stamp, mold, or mask to generate micro-patterns and microstructures, it was titled as 'soft' lithography. As compared with photo-lithography, soft lithography has many kinds of strength.
Ⅳ. Method & Structure of implementation
1) 프로젝트 세부 실험목표 : Topas™ COC로 만든 두께 0.1cm의 컵을 가정하고, 그것의 UV 투과도를 토대로 살균 가능한 컵으로서의 가능성을 살펴본다.
2) 실험방법 :
① Tg=140℃의 Topas를 이용한다. (Topas의 Tg는 첨가된 norbornene의 양에 따라 80℃에서 180℃까지 변한다.)