drug molecules to the target safely.
5.2.2 Nanocarriers - Nanoparticles
Before starting with the functionalization of nanoparticles, it is important to keep in mind a range of useful properties we wish to have in any drug delivery across the BBB(Blood brain barrier). In this context, owing to their small size, customizable surface, improved solubility, targeted drug delivery and multifunc
pattern, a resist for extreme ultraviolet (EUV) lithography requires a small line edge roughness (LER) and a high sensitivity.
Requirement of EUV resist can be explained below the figure. 4. we can summary the requirements of EUV resist with four points.
First, Resist sensitivity have to target 10mJ/cm2 to keep the required source power in a realistic target range of some 100W @ 100wph tpu
patterns and microstructures
Cracking during the stamp fabrication step
Deformation of the elastomeric stamp of mold
Density of defects in the formed pattern
Difficulty in high-resolution registration
low viscosity UV curable acrylated poly(dimethyl siloxane) material.
multi-functional acrylate cross-linker, free radical initiator.
When UV-vis light exposed, low viscosity UV-curab
(4) Double patterning
The double patterning is divided into four parts, leading with wafer requirements and then two sets of lithographic requirements (Generic Pitch Splitting - Double Patterning Requirements Driven by MPU metal Half-Pitch and Generic Spacer Patterning Requirements - Driven by Flash). The lithography requirements are different for each process; the requirements for pitch splitti
pattern의 요구에 따른 image 기술의 정도, solder mask의 다양화 등의 이유로 저부가가치 제품이라는 인식이 변하는 추세이다.
이 Single FPCB의 제조공정은 먼저 재단 → CNC → 동도금 → 회로형성 → Coverlay 가접/적층 → 표면처리 → B.B.T. → 가공/검사 등이다. 이것은 CD-rom pick up,