The lens is used to focus the sectioned UV light down to a smaller area on the chip. The smallest feature size capable of being written on the wafer is a function of the numerical aperture of the lens as well as the wavelength of the light.
uses a patterned elastomer(e.g. PDMS(Poly DiMethyl Siloxane)) as the stamp, mold, or mask to generate micro-patterns and microstructures
C
What is soft-lithography?
So, an alternative and non-photolithographic method that we call soft lithography was developed. Because this method uses a patterned elastomer(e.g. PDMS(Poly DiMethyl Siloxane)) as the stamp, mold, or mask to generate micro-patterns and microstructures, it was titled as 'soft' lithography. As compared with photo-lithography, soft lithography has many kinds of strength.
ML2 means the maskless lithography. It is necessary to refinement process. Described above, "double / mutiful patterning" in additional cost savings as an alternative to be appropriate. Nano devices with decreasing the size of the unilateral use light to produce a mask for the lithography process takes time and cost. Small production of nano scale patterning process is suitable, and the suitable
Like a finger in the macro world so feels a tiny tip on a lever in the nano world a surface Forces are in Pico Newton range the same like intermolecular binding forces
1-1. AFM tip
- actually feels the sample surface.
- silicon nitride
exhibit excellent flexibility, Contact AFM mode
- silicon crystal
high frequency oscillating(100kHz), more stiffer than silicon nitride, non co
1.Photolithography
리소그래피는 포토레지스트를 도포하는 공정으로 시작해 노광, 현상, 에칭, 포토레지스트 제거에 이르는 일련의 프로세스이다. 현상까지를 레지스트 처리공정으로 하며, 에칭 공정과 분리해서 생각할 수도 있다. 현재, 패턴 노광은 레티클이라 불리는 마스크 기판에 의해 축소 투영 전