(4) Double patterning
The double patterning is divided into four parts, leading with wafer requirements and then two sets of lithographic requirements (Generic Pitch Splitting - Double Patterning Requirements Driven by MPU metal Half-Pitch and Generic Spacer Patterning Requirements - Driven by Flash). The lithography requirements are different for each process; the requirements for pitch splitti
3. Experimental tools
1) Ultrasonic detector
It is widespread use of equipment that used in ultra sonic testing. And it also have lots of control function.
2) probe
A protected face transducer is a single element longitudinal wave contact transducer that can be used with either a delay line, protective membrane, or protective wear cap.
3) couplant A couplantis a material (usually liq
Advantage
① 낮은 성장률을 가지면서 높은 질의 epilayer을 생성
② 다양한 dopant 성분을 흡착이 가능하고, 복잡한 구조를
가진 다양한 layer를 생성
Disadvantage
① 고진공으로 인한 작동비용이 높음
② source material 교체로 인한 chamber 내부의 오염
③ As와 P이 포함되어 있는 alloy의 성장 제한
(i). The head of management and finance
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