○ PECVD
∙ What is PECVD?
⇒ Radio frequency(RF) is used to induce plasma in the deposition gas.
⇒ This results in a higher deposition rate at relatively low temperatures.
⇒ With the plasma enhanced CVD process is the deposition at temperature around 300℃ allows.
⇒ The temperature will be through encouragement of a plasma with high frequency electric fields triggered.
초 록
이번 실험에서는 Cu-IDA complex를 서로 다른 Cu(NO3)2?3H2O(aq, 0.02M): NH(CH2COOH)2(aq, 0.02M) 비율로 혼합하여 spectrophotometry로 흡광도를 측정하고, complex의 formula와 stability constant를 추정해보았다. 서로 다른 volume fraction(IDA: 2,5,7,10,12,13,15,18,20,23mL, total 25mL)의 mixture를 만들고, HNO3(aq, 15%)과 NaOH(aq, 0.5M)으로 모든 sam
of the neutral zone draw. To display the semiconductor doping level of Fermi level for the proper placement of the band (as shown in Figure 3-a in the neutral zone - energy band diagram, the same must be present.
In depletion layer of semiconductor, Fermi level of metals and semiconductors of the original difference between the curves corresponding to the amount of energy bands. This be
curve of graph to shift to the [Figure 12] C-V graph shift by direction of bias
side. These charges are generated by ions came in the process of deposition of oxide layer. When the charges exist in between the substrate and interface, the value of Vfb and C-V curve will shift by amount of the charge divided by Cox of Ci. The amount of shifting decreases as the position of fiexed charges is far f
2.7 Shrinkage
- Theoretical value: (a=35, : Maximum Shrinkage Strain Ratio)
- The process of finding 'a'
1. Arranging excel data
2. Finding 'a' with using a grapher program
(Converting Excel data into graph shape)
(Standardization of graph through regression analysis)-회귀분석을 통한 그래프 평균화
(Finding 'a' with using shrinkage equation)
3. Finding 'a'