(4) Double patterning
The double patterning is divided into four parts, leading with wafer requirements and then two sets of lithographic requirements (Generic Pitch Splitting - Double Patterning Requirements Driven by MPU metal Half-Pitch and Generic Spacer Patterning Requirements - Driven by Flash). The lithography requirements are different for each process; the requirements for pitch splitti
1. Photo Lithography
(1) 리소그래피 기술의 개요2-
(1)
리소그래피는 포토마스크 기판에 그려진 VLSI의 패턴을 웨이퍼 상에 전사하는 수단이다. 포토레지스트(감광성 수지)의 도포에서 시작되어 스테퍼(노광장치) 스테퍼(stepper) - p8 참조
에 의한 패턴의 축소투영노광, 현상을 거쳐 포토레지스트를
place and must be responsible for all the products at the right time
-Plant maintenance
> Replace the old equipments by the new one with specialized functions
> Period maintenance plan
> Continuously lower the downtime
-Purchasing
> Make purchasing plan in advance
> Collaborate with the suppliers, require the material must be well designed, and decisively refuse the defective ones
Ⅰ. Introduction
1. Background/ Definition of Problem
According to a survey of “International Transparency”, public institutions rectitude level of Korea in 2013 stayed # 46 of the countries surveyed 177 pieces. It means that Korea achieved significantly quantitative growth, but the qualitative level of the public organizations is inferior to the developed countries. October 10, 2014 accor
Summary and creative answers to Toyota Motor Manufacturing, U.S.A., Inc.
BACKGROUND Toyota invested up to 800 million dollars in Kentucky and made Toyota into a multinational corporate company. But Toyota very concerned about the reputation of high quality at low cost. Toyota tried to transplant its unique production system to Bluegrass Country effectively. In this way Toyota could increase