of LER and LWR because of interface of thickness between the phase. So, self assembly receive attention to possibility of overcoming the limitations of lithography technology. Actually, there are many problem compare with semiconductor processing like technology of removal defect, accuracy of pattern and registration. But recently as directed self-assembly(DSA) technology is advanced, that can re
of the elastomeric stamp of mold, density ofdefects in the formed pattern, and difficulty in high-resolution registration. So, to solve these problems, we could find the following article. "Hybrid NanoImprint-Soft Lithography with Sub-15nm Resolution by Zhiwei Li, Yanni Gu, Lei Wang, Haixiong Ge, Wei Wu, Qiangfei Xia, Changsheng Yuan, Yanfeng Chen, Bo Cui, and R. Stanley Williams. NANO LETTERS 2
of the numerical aperture of the lens as well as the wavelength of the light.
uses a patterned elastomer(e.g. PDMS(Poly DiMethyl Siloxane)) as the stamp, mold, or mask to generate micro-patterns and microstructures
Cracking during the stamp fabrication step
Deformation of the elastomeric stamp of mold
Density ofdefects in the formed pattern
Difficulty in high-resolution registration
of sexual abuse on disabled females or children under 13 years old are liable to penal servitude or even life imprisonment in jail; that they will repeal the statute of limitations on the crime of sexual abuse; that additional or worse punishment can be inflicted on professors or workers of facilities for handicapped or disabled individuals; and that they will adopt resolutions to prevent human r
Summary and creative answers to Toyota Motor Manufacturing, U.S.A., Inc.
BACKGROUND Toyota invested up to 800 million dollars in Kentucky and made Toyota into a multinational corporate company. But Toyota very concerned about the reputation of high quality at low cost. Toyota tried to transplant its unique production system to Bluegrass Country effectively. In this way Toyota could increase