4. Equipment
4.1 RCA cleaning
RCA cleaning is a series of rinsing procedure prior to experiment with Si wafer. The purpose of the RCA clean is to remove organic contaminants (such as dust particles, grease or silica gel) from the wafer surface. There are three steps to be performed. The first step is to remove organic contaminant from surface of wafer. Second step is to remove any oxide layer
curve shift toward applied voltage because the movement of charges is determined by applied voltage(-,+). It is known that mobile charges are generated when dielectric material has the impurities such as Na ion.
The term fast interface state refers to the fact that these defects can change their charge state relatively fast in response to changes of the gate bias. As the surface potential in a
1) 커패시터란 ?
이 소자는 두개의 단자 사이에 전압을 가했을 때 전압의 단위 시간당 변화에 따라 비례적으로 변화하는 부품을 말하며, 일명 CONDENSER(컨덴서)라고도 한다. 저항과 다른 점은, 저항은 전압이 올라가면 흐르는 전류가 많아지지만 커패시터는 높은 전압을 가해도 일정한 전압이 유지되면,
barrier in the semiconductor.
Electric field to pass only because the atomic distance, metal within the energy - band is not observed any change in the diagram. In conclusion, the energy barrier for electrons in metals, respectively, is independent of the semiconductor doping and applied bias.
Reverse Bias
Now we can consider the effects forward bias station. Figure 3.21a the
■ Objectives of Defense-in-Depth
• To compensate for potential human and component
failures
• To maintain the effectiveness of the barriers by averting
damage to the facilities and to the barriers themselves
• To protect the public and the environment from harm in
the event that those barriers are not fully effective
■ Strategy of