patterns and microstructures, it was titled as 'soft' lithography. As compared with photo-lithography, soft lithography has many kinds of strength. It is low in capital cost, easy to learn, simple to apply, and accessible to a wide range of users. And it can generate structures on both planar and non-planar surfaces, and generate both 2D and 3D structures, while photo-lithography only on planar s
The lens is used to focus the sectioned UV light down to a smaller area on the chip. The smallest feature size capable of being written on the wafer is a function of the numerical aperture of the lens as well as the wavelength of the light.
uses a patterned elastomer(e.g. PDMS(Poly DiMethyl Siloxane)) as the stamp, mold, or mask to generate micro-patterns and microstructures
C
ML2 means the maskless lithography. It is necessary to refinement process. Described above, "double / mutiful patterning" in additional cost savings as an alternative to be appropriate. Nano devices with decreasing the size of the unilateral use light to produce a mask for the lithography process takes time and cost. Small production of nano scale patterning process is suitable, and the suitable
(4) Double patterning
The double patterning is divided into four parts, leading with wafer requirements and then two sets of lithographic requirements (Generic Pitch Splitting - Double Patterning Requirements Driven by MPU metal Half-Pitch and Generic Spacer Patterning Requirements - Driven by Flash). The lithography requirements are different for each process; the requirements for pitch splitti
어떤 분야의 연구에서나 지식이 조직되어지고 검증되어지며, 적용방법뿐만 아니라 지식을 개발해야 하는 목표를 가지고 지식의 종류를 결정하는 것이 일반적이다. 간호실무의 근거가 되는 지식체는 현상에 관한 사고의 특징적인 방법들을 예측하고 예시하는 범위를 제공하는 pattern과 form, structure를 가