4. Equipment
4.1 RCA cleaning
RCA cleaning is a series of rinsing procedure prior to experiment with Si wafer. The purpose of the RCA clean is to remove organic contaminants (such as dust particles, grease or silica gel) from the wafer surface. There are three steps to be performed. The first step is to remove organic contaminant from surface of wafer. Second step is to remove any oxide layer
Chemical energy Electrical energy
Characteristic
Chemical reaction
-use oxidation
-supply fuels and oxygen from outside
-emission products to outside
Fossil fuel is limited
Fossil fuel is the main reason of global warming
The rate of energy dependence on imports is 96.8%
Increase energy import price by increasing international oil
planar and non-planar surfaces, and generate both 2D and 3D structures, while photo-lithography only on planar surface and 2D structures. Also, it doesn't need to use light or other high energy particles. Photo-lithography can be applied to only polymers with photo-sensitive, but soft lithography can be applied to various polymers, like unsensitized polymers, precursor polymers, conducting polyme
The Age of Innocence
[At the Theatre in the evening. Newland Archer enters the box. Steps to the front,
joining the company of several men, including Larry Lefferts and Sillerton Jackson. Larry
looks at stage through pearl opera glasses. Then he swings his opera glasses away from
the stage and toward another box. He sees the figure of a woman entering a box across the
way. Although the woman, sil
THE LOST WORLD
JURASSIC PARK
screenplay by
David Koepp
EXT. TROPICAL LAGOON - DAY
A 135-foot-luxury yacht is anchored just offshore in a
tropical lagoon. The beach is a stunning crescent of white
sand at the jungle fringe, utterly deserted.
ISLA SORNA
87 miles southeast of Nublar
Two SHIP HANDS, dressed in white uniforms, have set up a
picnic table with three chairs on the sand and are carefully