ML2 means the maskless lithography. It is necessary to refinement process. Described above, "double / mutiful patterning" in additional cost savings as an alternative to be appropriate. Nano devices with decreasing the size of the unilateral use light to produce a mask for the lithography process takes time and cost. Small production of nano scale patterning process is suitable, and the suitable
(4) Double patterning
The double patterning is divided into four parts, leading with wafer requirements and then two sets of lithographic requirements (Generic Pitch Splitting - Double Patterning Requirements Driven by MPU metal Half-Pitch and Generic Spacer Patterning Requirements - Driven by Flash). The lithography requirements are different for each process; the requirements for pitch splitti
1.1 Soft lithography
Microstructure나 nanostructure을 만들기 위한 printing, molding의 과정을 포함하는 technique으로, 일반적으로 printing, molding, transfer의 3단계 과정을 거친다.
1.1.1 Printing
Master를 만드는 과정이다. Photolithography, e-beam, micro-machining, photoresist 등 다양한 방법을 통해 원하는 모양을 가지는 master를 제작할
disequilibrium analysis.[1] Thus, the more recent SNP concept has basically arisen from the recent need for very high densities of genetic markers for the studies of multifactorial diseases, and the recent progress in polymorphism detection and genotyping techniques.[2] For these reasons, efforts to detect SNPs are ongoing nowadays, and need for faster and more convenient detection is emerging.