Xia, Changsheng Yuan, Yanfeng Chen, Bo Cui, and R. Stanley Williams. NANO LETTERS 2009 Vol.9, No.6 2306~2310"
Article : To achieve high resolution patterning
Soft lithography commonly uses PDMS to stamp. It enables a conformal contact with substrates or the master mold over a large area without applying external pressure. But low elastic modulus of PDMS limits to produce on sub-100nm scale.
The lens is used to focus the sectioned UV light down to a smaller area on the chip. The smallest feature size capable of being written on the wafer is a function of the numerical aperture of the lens as well as the wavelength of the light.
uses a patterned elastomer(e.g. PDMS(Poly DiMethyl Siloxane)) as the stamp, mold, or mask to generate micro-patterns and microstructures
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