→ ALDis based on the sequential use of a gas phase
chemical process. ALD film growth is self-limited and
based on surface reactions, which makes achieving
atomic scale deposition control possible.
☞ Self-limited growth
☞ Atomic scale deposition
☞ Easy way to produce
uniform, crystalline,
high quality thin films.
-결정성 평가
-FWHM (Full wi
First, Substrate is consists of a plastic or glass, a portion of the OLED is supportive.Anode is a role that make electron holes when current flows by removing electron. And the upper Conducting Layer is the place that Electron Holes is being created.Emissive Layer is the place accepting an electron from Cathode and produce light.
Emissive layer and conducting layer are called organic layer beca
is harmful to human health in its own right.
2. NOx reaction produces tropospheric ozone.
3. NOx causes acid rain, smog, and destruction of forests.
- This problems become more serious due to the rapid increase of car.
Sensitivity
▪ Temperature
▪ Catalyst
▪ Large surface area
▪ Low carrier concentration
▪ Small grain size
▪ Metal oxide structure