◈ Solar cells placed is potential difference
at open-circuit state, when it receive the light.
◈ Maximum Voc is obtained by work function difference
between P-type material and N-type material.
◈ Voc,max = N-type material’s LUMO level
– P-type material’s HOMO level
(4) Double patterning
The double patterning is divided into four parts, leading with wafer requirements and then two sets of lithographic requirements (Generic Pitch Splitting - Double Patterning Requirements Driven by MPU metal Half-Pitch and Generic Spacer Patterning Requirements - Driven by Flash). The lithography requirements are different for each process; the requirements for pitch splitti