Tungsten filament was
heated to generate electron.
Revolving 270, the electrons
are directed by
electromagnetic field
resulting collision onto the
source surface
After heated to certain
degree, source gas was
generated
The sensor monitors the
thickness of deposited film.
High vacuum should be kept in
the chamber not to contain
oxigen
gas which damages
substrat
Gas concentration
- Deposition : 100nm
Why we use Sputter?
- Good for high Melting point Material
- Thickness uniformity
- Positive adhesion
- But, law growth rate and step coverage
Patterning : Photo Lithography
(Clear than Shadow Mask)
Why Al is used for electrode?
(Especially Gate)
- Law melting point
- Work function
- High-K, Good mobility
-