isa suitable size of sample. We must caution a deterioration by air, gas, humidity and pouring of impurities in procedure of sample grinding.
3.2. Filling up Powder at Sample Holder
X-ray diffractometer need toa flat sample plane of 1cm×2cm. We fill up powder at holder to obtaina flat sample plane. A procedure is below(Fig. 10) when we fill up at a general metal holder.
Fig. 1
the samples. Fig. 1 (a) isthe typical XRD pattern of ZnO films with a preferred C axis orientation of (002) which has a full width at half maximum (FWHM) of 0.3°. The XRD pattern of sample (b) also shows the high C axis oriented ZnO grains with FWHM of 0.5°, which suggests that the crystallization of ZnO turns worse. Meanwhile, other three additional peaks attributed to Zn2GeO4 are observed in
a better crystallinity and some internal stress inthe film
Fig. 1. The XRD patterns forthe film inas-grown state
and sputtered at different powers.
has been released [16]. At the point, four other new peaks can be observed at 2θ = 12.398, 24.978, 27.288, and 33.268, which correspond tothediffraction peaks of Zn2GeO4 (1 1 0), Zn2GeO4 (2 2 0), Ge (1 1 1) and GeO, respectively. It is e
FE-SEM images ofall the samples. Forall the samples, the columnar shaped ZnO grains grown normal tothe substrate surface are clearly seen. When MZO and GZO films are deposited after ZnO films, it seems that similar columnar shaped grains are formed. It can indicate if the same conditions are preserved, all films can be grownvertically. It is very similar patterns reported in literature [1].
a). Thisindicates that the ZnO nanowire growth was governed by a VLS process. Fig. 1(a) shows ZnO nanowires obtained under the same condition as the ones inFig. 1(a). But as they were grown inthe margin, the size were much larger andthe catalyst particles cannot be seen clearly at the tips ofthe nanowires under the resolving capability ofthe SEM. The VLS growth mechanism is identical tothe