process
Fast deposition speed
Cheap process device
1. Partially different thickness
2. Difficult to control the element ratio
3. Hard to deposition the complex material layer
4. Low film quality
3.Material to be evaporated by e-beam
- E-beam dashes against
material
- E-beam transport energy
to the material
- Then evaporation process
is start
2. Experimental
2.1. Film preparation
Pure ZnO thinfilms were prepared on the glass substrate using RF magnetron sputtering system. And Mg, Ga doped (3 wt%) ZnO thinfilms were prepared on the ZnO pre-sputtered glass substrate using RF magnetron sputtering system. The PureZnO target was made from high purity ZnO powder (99.99 %) . The MZO/GZO targets were made from high purity ZnO powder (
① 컨트롤러
여기서 의미하는 컨트롤러는 하드디스크에 있는 것으로,메인보드의 IDE컨트롤러와는 다른 것이다. 컨트롤러에 의해 스테핑 모터와 헤드를 제어하고, IDE와 통신한다. 컨트롤러는 일반적으로 하드디스크의 뒷면에 붙어 있음. 컨트롤러에는 하드디스크를 마스터로 사용할 것인지 슬레이브
WHAT IS THINFILM?
KIST Definition (1991)
- ThinFilm : 기판층(substrate layer)에 형성된 수 m 이하의 두께를
갖는 것으로 독립적인 기능을 보유한 막.
ADVANTAGES OF THINFILM
Complexibility and Accumulations
Easy processing
lm)
Easy Control of Thermal, Mechanical and Chemical Properties
Down the Cost of Production
High-Reliance
WHAT IS cvd?
Principle of cvd