소개글
[반도체] Chemical Vapor Deposition(CVD)에 대한 자료입니다.
목차
Introduction
Mechanism
Theory
Methods
References
본문내용
Advantages:
?
high growth rates possible
?
can deposit materials which are hard to evaporate
?
good reproducibility
?
can grow epitaxial films
Disadvantages:
?
high temperatures
?
complex processes
?
toxic and corrosive gasses
참고문헌
Introduction to microelectronic fabrication
nd
2
edition, R.C. Jaeger, Prentice Hall, 2002, NJ
Silicon processing for the VLSI Era
nd
Volume 1: Process Technology, 2
edition, W. Wolf
and R.N. Tauber, Lattice Press,
2000, Ca
Photonic and Electronic Device Laboratory Homepage
in Havard
University
Microelectronic Engineering Department Homepage
in Rochester Institute of Technology