An organic light emitting diode (OLED) is a solid state device like the LED but composed of several layers in which the emissive electroluminescent layer is a film of organic compounds which emit light in response to an electric current.
Function of each part
Cathode : injecting electron composed of metal
Anode : injecting hole composed of transparent ITO
Emissive polymer : reco
B. Solution-Liquid-Solid Growth of Indium Phosphide Fibers from Organometallic Precursors: Elucidation of Molecular and Nonmolecular Components of the Pathway
Solution-phase organometallic syntheses of semiconductors are used for the growth of high-quality quantum dots,1-3 and are potentially useful for the deposition of semiconductor materials on thermally sensitive substrates such as polymers
Electrodepostion is a process that
colloidal particles suspended in a liquid medium
migrate under the influence of an electric field
and are deposited onto an electrode !
“We can make better capacitor by
Improving quality of nanowires
Made from SLS mechanism”
1. Make template(Anodic Aluminium Oxide – AAO method)
2. Fill the catalyst in the
4. Equipment
4.1 RCA cleaning
RCA cleaning is a series of rinsing procedure prior to experiment with Si wafer. The purpose of the RCA clean is to remove organic contaminants (such as dust particles, grease or silica gel) from the wafer surface. There are three steps to be performed. The first step is to remove organic contaminant from surface of wafer. Second step is to remove any oxide layer
Ⅲ. Characteristics of New Pension System in Chile
1. Individual Capitalization Accounts (ICA)
In Chile, they have pension system that subscribers pay back from their individual accounts after retirement. Therefore this account have no income redistribution among inter-layers and no income transfer between generations that exist in korean pension system. ICA's contributions are not inc
layer, and the surrounding water molecules, the bulk solution, the target molecules, ions, etc. Interactions coming from electrostatic, hydration, steric and van der Waals forces, changes in the surface hydrophobicity or conformational changes of the adsorbed molecules play an important role in the final bending.[1],[2] The easiest and most extended model to study the surface stress produced on c
deposition, the glass substrates were cleaned using the typical method, successively. The cleaned substrates were blown by high purity N2 gas for drying before being introduced into the sputtering chamber. The chamber was initially evacuated to a base pressure of 4.9*10-6Torr, and the deposition was carried out at a working pressure of 6*10-3Torr. The Ar gas was used as plasma source and gas flow
The ZnO:Al films were deposited onto glass substrates.
A ceramic ZnO:Al2O3 (2 wt.%) target was used.
the chamber was evacuated to a background pressure of 5 *10-4 Pa
The working pressure during the film deposition was in the range from 0.3 Pa to 1.0 Pa by applying pure Ar gas.
The discharge power was between 100 and 200 W.
As the increasing of the thickness of the deposited film,