use. On the contrary, he makes cultural such idealizing, structural features, actions, and practices that cannot be exhausted by descriptions of specific occasions. Habermas offers a pattern for what Weber called “rational explanation,” starting from idealizing assumptions that provide the formal- rational structure of each action type.
Explanatory pattern for communicative action can be div
ML2 means the maskless lithography. It is necessary to refinement process. Described above, "double / mutiful patterning" in additional cost savings as an alternative to be appropriate. Nano devices with decreasing the size of the unilateral use light to produce a mask for the lithography process takes time and cost. Small production of nano scale patterning process is suitable, and the suitable
use light or other high energy particles. Photo-lithography can be applied to only polymers with photo-sensitive, but soft lithography can be applied to various polymers, like unsensitized polymers, precursor polymers, conducting polymers, etc. But, naturally, soft lithography has some drawbacks such as deformation of the elastomeric stamp of mold, density of defects in the formed pattern, and di
patterning is easy
4) 독성이 없음
no toxic
5) 400도 이하에서 형성, 유리기판 사용 가능
glass substrate can be possible
inverted-staggered 구조를 만드는 공정방법은 크게 2가지가 있다.
for making inverted-staggered TFT we usually use these two method, BCE and ES
1.Etch stopper를 이용한 공정
2.Back-channel-etched(BCE)공정
-그림첨부-
et
use of structure and grammar needs to be an integral part of the way in which the target language is taught and practised rather than the subject of theoretical exposition.
5) Language learning and acquisition skills
Conscious techniques of memorization and enhanced skills of listening (tuning of the ear, recognition of sound patterns) and speaking (training of the vocal organs to rep