[3] Thin Film Deposition
초집적 반도체를 구성하는 소자들은 그 특성상 그 크기가 매우 얇아(작고) 미세한 조직을 가진다. 그리고 이것은 박막 증착(TFD = Thin Film Deposition) 공정을 통해 제작된다. 박막 증착이란 이름 그대로 표면에 얇은 막을 씌우는 기술을 뜻하는데 이 공정을 통해 기판(substrate)이나 이전에
Ion ImplantationIonized dopant atoms are physically forced into the silicon crystal by accelerating them through high potentials (3 kV- 3 MV) toward the silicon wafer.
– Mass separator allows each implanter to run multiple
processes (B, P, BF2, As...)
– Low temperature (room temperature ~200 °C)
• can use photoresist as a mask
– Needs to be followed by an anneal
remove large debris such as sticks, leaves, trash and other large particles
water stored in reservoirs for periods between a few days and many months to allow natural biological purification to take place
salts are treated with soda-ash (Na2CO3) to precipitate CaCO3 out utilizing the common-ion effect
chlorinated to minimize the growth of fouling organisms on the pipe-work and tanks
in renewed interests in electric cars from both consumers and producers.
heavy metals
fluoride based salts
arsenic
sulphates
organic solvents and lithium (a highly reactive
alkaline metal)
Governments
next-generation growth engine business
domestic production market will be more active
-after 2012,
kyoto protocol Specified countries ->more hybrid car battery will needed