sensitive material로, 특정 geometric pattern을 가지는 photomask를 위에 두고 빛에 expose 시켜주면 mask가 덮인 부분은 그대로 있으나 mask가 덮이지 않은 부분은 빛에 그대로 노출되어 해당 부위만 구조적 변형이 발생한다. Photoresist의 종류에는 photopolymeric, photodecomposing, photocrosslinking 등이 있으며, 그 중 photocrosslinking
1. Introduction
While the nation is the 15th largest in the world in terms of nominal Gross National Product, it is the number 10 in electricity consumption According to the CIA World Factbook’s 2009 report. ~
(4) Double patterning
The double patterning is divided into four parts, leading with wafer requirements and then two sets of lithographic requirements (Generic Pitch Splitting - Double Patterning Requirements Driven by MPU metal Half-Pitch and Generic Spacer Patterning Requirements - Driven by Flash). The lithography requirements are different for each process; the requirements for pitch splitti
NIMTAAVG – a weighted average of past quarterly ratios of net income to market value of total assets
TLMTA – the ratio of book value of total liabilities to market value of total assets
EXRETAVG – a weighted average of past monthly log returns relative to the S&P 500 value-weighted return
RSIZE – the log ratio of a firm’s market capitalization to that of the S&P 500 i