the uneven power distribution, and also may result in over
Cooling of large areas, leading to excessive package cost.
• Active cooling technologies have shed new light on this matter.
AndThermoelectric cooler(TEC) has been the most accessible one.
Not discrete, thick bulk materials.
• Some of literature describe about thin-film TEC
Venkatasubramanian et al.
Bottner et al
of ZnO nanowires.
Fig1. (a) ZnO nanowires grown in the margin.
(b) ZnO nanowires with gold particle at the tips.
The morphology and structure ofthe prepared products at step two were analyzed by SEM. Fig. 1(b) shows the SEM image of samples fabricated at step two, displaying an interesting hierarchical pure ZnO nanostructure with lengths of several decade microns. Thehigh-magnifi
:
Maximum 200°C/min
*Separate Electric furnace and other system like Electronic scale
-Because Electric furnace temperature is very high
so we need to protect other system.
instrument composition
-Electric furnace
Temperature range:
25°C~1500°C
Heat speed :
Maximum 200°C/min
*Nitrogen or Argon in Electric furnace
-Because the inhibition of oxidization of sample
highly absorbed by all materials, even EUV optical components inside the lithography tool are susceptible to damage, mainly manifest as observable ablation. Such damage that is associated with thehigh-energy process of generating EUV radiation is a new concern specific to EUV lithography .
EUVL's shorter wavelength also increases flare, resulting in less than perfect image quality and increase